Vapor Phase Doping with N-type Dopant into Silicon by Atmospheric Pressure Chemical Vapor Deposition
Shotaro Takeuchi(Fukui Prefectural University), Matty Caymax(IMEC), Thierry Conard(IMEC), Roger Loo(IMEC), Ngoc Duy Nguyen(University of Liège), Wilfried Vandervorst(Imec the Netherlands), Frederik Leys(IMEC)
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