Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth
Francesca Iacopi(IMEC), Hefin Griffiths(Oxford Instruments (United Kingdom)), Nele Moelans(KU Leuven), Olivier Richard(IMEC), Christophe Detavernier(Ghent University Hospital), Matty Caymax(IMEC), Philippe M. Vereecken(University of Illinois Urbana-Champaign), Marc Schaekers(IMEC), Bart Blanpain(KU Leuven)
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