A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growth
Roger Loo(IMEC), Olivier Richard(IMEC), Frank Holsteyns, Matty Caymax(IMEC), I. Peytier(IMEC), Peter Verheyen(IMEC), Stefan Kubicek(Austrian Academy of Sciences), Philippe Meunier-Beillard(Philips (Belgium)), Richard Lindsay(Petroleum of Venezuela (Venezuela))
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