Successful Selective Epitaxial Si[sub 1−x]Ge[sub x] Deposition Process for HBT-BiCMOS and High Mobility Heterojunction pMOS ApplicationsRoger Loo, K. De Meyer, Wilfried Vandervorst et al.|Journal of The Electrochemical Society|2003Cited by 35
A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growthRoger Loo, Olivier Richard, Matty Caymax et al.|Applied Surface Science|2003Cited by 29
An (un)solvable problem in SIMS: B-interfacial profilingWilfried Vandervorst, G. Dollinger, A. Bergmaier et al.|Applied Surface Science|2002Cited by 22