Status 157-nm lithography development at IMEC
Kurt Ronse(IMEC), Harry Sewell(ASML (United States)), Timothy K. O'Neil(ASML (United States)), Dieter Van den Heuvel(IMEC), Frieda Van Roey(IMEC), R. Jonckheere(IMEC), A. Eliat(IMEC), Bruce A. Tirri(ASML (United States)), Jan Hermans(IMEC), S. Beckx(Imec the Netherlands), Peter De Bisschop(IMEC), Johan M. Wouters(IMEC), Anne-Marie Goethals(IMEC), Jean‐François de Marneffe(IMEC)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
June 25, 2003
Cited by 1
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