Impact of Process Optimizations on the Electrical Performance of High-k Layers Deposited by Aqueous Chemical Solution Deposition
Sven Van Elshocht(Columbia University), Stefan De Gendt(Imec the Netherlands), Thierry Conard(IMEC), J. Mullens(Hasselt University), Matty Caymax(IMEC), Marlies K. Van Bael(IMEC), An Hardy(IMEC), Christoph Adelmann(Imec the Netherlands), Alexis Franquet(IMEC), Olivier Richard(IMEC)
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