Hf O 2 high-κ gate dielectrics on Ge (100) by atomic oxygen beam deposition
A. Dimoulas(National Centre of Scientific Research "Demokritos"), Matty Caymax(IMEC), E. K. Evangelou(National Centre of Scientific Research "Demokritos"), Nikos Boukos(National Centre of Scientific Research "Demokritos"), G. Mavrou(National Centre of Scientific Research "Demokritos"), Michel Houssa(IMEC), G. Vellianitis(NXP (Belgium))
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