Hf O 2 high-κ gate dielectrics on Ge (100) by atomic oxygen beam depositionA. Dimoulas, Matty Caymax, Nikos Boukos et al.|Applied Physics Letters|2005Cited by 151
Materials and electrical characterization of molecular beam deposited CeO2 and CeO2/HfO2 bilayers on germaniumD.P. Brunco, M. M. Heyns, A. Dimoulas et al.|Journal of Applied Physics|2007Cited by 50