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Influence of Ni and Nb thickness on low specific contact resistance and high-temperature reliability of ohmic contacts to 4H-SiCVuong Van Cuong, Shin-Ichiro Kuroki, Tomonori Maeda et al.|Japanese Journal of Applied Physics|2019Cited by 6
CF <sub>4</sub> :O <sub>2</sub> surface etching for the improvement of contact resistance and high-temperature reliability in Ni/Nb ohmic contacts on n-type 4H-SiCVuong Van Cuong, Shin-Ichiro Kuroki, Takamichi Miyazaki et al.|Japanese Journal of Applied Physics|2020Cited by 4
500 °C high-temperature reliability of Ni/Nb ohmic contact on n-type 4H-SiCVuong Van Cuong, Shin-Ichiro Kuroki, Tadashi Sato et al.|Japanese Journal of Applied Physics|2021Cited by 3
High-temperature reliability of Ni/Ti/Nb ohmic contact on p-type 4H-SiCVũ Thị Thu Hà, Shin-Ichiro Kuroki, Vuong Van Cuong et al.|Japanese Journal of Applied Physics|2025Cited by 1