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CF <sub>4</sub> :O <sub>2</sub> surface etching for the improvement of contact resistance and high-temperature reliability in Ni/Nb ohmic contacts on n-type 4H-SiCVuong Van Cuong, Shin-Ichiro Kuroki, Takamichi Miyazaki et al.|Japanese Journal of Applied Physics|2020Cited by 4
Optimization of Ni/Nb Ratio for High-Temperature-Reliable Ni/Nb Silicide Ohmic Contact on 4H-SiCVuong Van Cuong, Shin-Ichiro Kuroki, Tomoyuki Koganezawa et al.|Materials science forum|2019Cited by 0