CF <sub>4</sub> :O <sub>2</sub> surface etching for the improvement of contact resistance and high-temperature reliability in Ni/Nb ohmic contacts on n-type 4H-SiC
Vuong Van Cuong(Hiroshima University), Shin-Ichiro Kuroki(Hiroshima University), Tomoyuki Koganezawa(Japan Synchrotron Radiation Research Institute), Hiroshi Sezaki, Satoshi Yasuno(Japan Synchrotron Radiation Research Institute), Seiji Ishikawa, Takamichi Miyazaki(Tohoku University), Tomonori Maeda
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