Study of Low-Energy Doping Processes Using Continuous Anodic Oxidation Technique/Differential Hall Effect MeasurementsShu Qin, Allen McTeer, S. Prussin et al.|IEEE Transactions on Plasma Science|2009Cited by 13
Study of Damage Engineering—Quantitative Scatter Defect Measurements of Ultralow Energy Implantation Doping Using the Continuous Anodic Oxidation Technique/Differential Hall EffectShu Qin, Jason Reyes, S. Prussin et al.|IEEE Transactions on Plasma Science|2012Cited by 3
Carrier mobility enhancement versus channel direction in highly-doped SiShu Qin, Allen McTeer, Yongjun Hu et al.|Surface and Coatings Technology|2012Cited by 0
Study of Carrier Mobility of Low-Energy, High-Dose Ion Implantations Using Continuous Anodic Oxidation Technique/Differential Hall Effect (CAOT/DHE) MeasurementsShu Qin, Jason Reyes, Yongjun Hu et al.|Unknown|2010Cited by 0