Study of Damage Engineering—Quantitative Scatter Defect Measurements of Ultralow Energy Implantation Doping Using the Continuous Anodic Oxidation Technique/Differential Hall Effect
Shu Qin(Micron (United States)), Jason Reyes(University of California, Los Angeles), Allen McTeer(Micron (United States)), Yongjun Hu(South China Normal University), S. Prussin(University of California, Los Angeles)
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