Molybdenum Nitride as a Scalable and Thermally Stable pWFM for CFETHiroaki Arimura, Naoto Horiguchi, B. T. Chan et al.|Unknown|2023Cited by 6
Multi-Vt Gate Stack Technologies for Nanosheet and CFET DevicesHiroaki Arimura, Naoto Horiguchi, J. Franco et al.|Unknown|2024Cited by 4
DRAM-Peri FinFET - A Thermally-Stable High-Performance Advanced CMOS RMG Platform with Mo-Based pWFM for sub-10nm DRAMJhuma Ganguly, Naoto Horiguchi, H. Arimura et al.|Unknown|2024Cited by 2