Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error controlYosuke Kojima, Ken Ozawa, Satoshi Okazaki et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2007Cited by 5
A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imagingKazuya Iwase, Fumikatsu Uesawa, Kiichi Ishikawa et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2005Cited by 2
Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error controlYosuke Kojima, Ken Ozawa, Kiichi Ishikawa et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2007Cited by 1