Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control
Yosuke Kojima(Toppan (Japan)), Ken Ozawa(Sony (Taiwan)), Hiroki Yoshikawa(ShinEtsu Chemical (Japan)), Kazuya Iwase(Sony (Taiwan)), Masanori Shirasaki(Toppan (Japan)), Tsuyoshi Tanaka(Nagoya University), Yukio Inazuki(ShinEtsu Chemical (Japan)), Kazuaki Chiba(Toppan (Japan)), Kiichi Ishikawa(Okazaki City Hospital), Satoshi Okazaki
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
January 1, 2007
Cited by 1
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