A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging
Kazuya Iwase(Sony (Taiwan)), Fumikatsu Uesawa(Sony (Taiwan)), Ken Ozawa(Sony (Taiwan)), Koichi Takeuchi(Sony (Taiwan)), Kiichi Ishikawa(Okazaki City Hospital)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
October 21, 2005
Cited by 2
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