Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control
Yosuke Kojima(Toppan (Japan)), Ken Ozawa(Sony (Taiwan)), Kazuya Iwase(Sony (Taiwan)), Satoshi Okazaki(ShinEtsu Chemical (Japan)), Masanori Shirasaki(Toppan (Japan)), Tsuyoshi Tanaka(Nagoya University), Yukio Inazuki(ShinEtsu Chemical (Japan)), Kazuaki Chiba(Toppan (Japan)), Kiichi Ishikawa(Okazaki City Hospital), Hiroki Yoshikawa(ShinEtsu Chemical (Japan))
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
May 3, 2007
Cited by 5
Related Papers
Oil Accumulation by the Oleaginous Diatom <i>Fistulifera solaris</i> as Revealed by the Genome and Transcriptome
|The Plant Cell|2015|193
Investigation of the antiviral properties of copper iodide nanoparticles against feline calicivirus
|Journal of Bioscience and Bioengineering|2012|152
The evolution of concepts of melanin biology.
|PubMed|1967|134
Refractory inclusions in the Murchison meteorite
|Geochimica et Cosmochimica Acta|1983|130
Chemical composition of HAL, an isotopically-unusual Allende inclusion
|Geochimica et Cosmochimica Acta|1982|93