Optimization of Ni/Nb Ratio for High-Temperature-Reliable Ni/Nb Silicide Ohmic Contact on 4H-SiC
Vuong Van Cuong(Hiroshima University), Shin-Ichiro Kuroki(Hiroshima University), Tomoyuki Koganezawa(Japan Synchrotron Radiation Research Institute), Seiji Ishikawa, Tomonori Maeda, Hiroshi Sezaki, Satoshi Yasuno(Japan Synchrotron Radiation Research Institute)
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