New Systematic Evaluation Method for Attenuated Phase-Shifting Mask SpecificationsIchiro Kagami, Tohru Ogawa, Kiichi Ishikawa et al.|Japanese Journal of Applied Physics|1995Cited by 2
Development of Cr-based attenuated phase-shift mask process for 0.18-μm device generationIchiro Kagami, Hiroichi Kawahira, Daichi Kakuta et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1999Cited by 1
<title>Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity</title>Minoru Sugawara, Satoru Nozawa, Kiichi Ishikawa et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1995Cited by 0
<title>Attenuated phase-shifting mask specification with modified beam illumination</title>Ichiro Kagami, Satoru Nozawa, Keisuke Tsudaka et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1995Cited by 0
Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser lithographyIchiro Kagami, Hiroichi Kawahira, Kiichi Ishikawa et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1999Cited by 0