Development of Cr-based attenuated phase-shift mask process for 0.18-μm device generation
Ichiro Kagami, Hiroichi Kawahira, Daichi Kakuta(Sony (Taiwan)), Kiichi Ishikawa(Okazaki City Hospital)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
August 25, 1999
Cited by 1
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