Development of Cr-based attenuated phase-shift mask process for 0.18-μm device generationIchiro Kagami, Hiroichi Kawahira, Daichi Kakuta et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1999Cited by 1
Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser lithographyIchiro Kagami, Hiroichi Kawahira, Kiichi Ishikawa et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1999Cited by 0