AlN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (2)Shuichi Noda, Shiro Hara, Ryuichiro Kamei et al.|The Japan Society of Applied Physics|2020Cited by 1
Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2)Shuichi Noda, Shiro Hara, Kazuhiro Koga et al.|The Japan Society of Applied Physics|2019Cited by 0
A Study of Al Wiring and Al Gate with A Minimal Sputtering ToolShuichi Noda, Shiro Hara, Hiroyuki Tanaka et al.|The Japan Society of Applied Physics|2021Cited by 0