Au‐Free Ti/Al/Ni/TiN Ohmic Contact to AlGaN/GaN Heterostructure: Ti/Al Thicknesses at an Optimized Ratio
Maoqing Ling(University of Liverpool), Wen Liu(Xi’an Jiaotong-Liverpool University), Yuanlei Zhang(Xi’an Jiaotong-Liverpool University), Yinchao Zhao(University of Liverpool), Harm van Zalinge(University of Liverpool), Kain Lu Low(University of Liverpool), Weisheng Wang(Xi’an Jiaotong-Liverpool University), Zhiwei Sun(Xi’an Jiaotong-Liverpool University), Jie Zhang(Army Medical University), Ping Zhang(University of Liverpool), Ivona Z. Mitrović(University of Liverpool), Jingang Li(University of Liverpool)
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