Impact of Charge trapping on Imprint and its Recovery in HfO<sub>2</sub> based FeFET
Y. Higashi, Jan Van Houdt(IMEC), Kaustuv Banerjee(IMEC), Luca Piazza(IMEC), Umberto Celano(Arizona State University), B. Kaczer(IMEC), N. Ronchi(IMEC), S. R. C. McMitchell(IMEC), Albert Minj(IMEC), Masatoshi Suzuki(IMEC), D. Linten(IMEC), Sergiu Clima(IMEC)
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