Effects of H<sub>2</sub> and N<sub>2</sub> treatment for B<sub>2</sub>H<sub>6</sub> dosing process on TiN surfaces during atomic layer deposition: an <i>ab initio</i> study
Hwanyeol Park(Hanyang University), Gun‐Do Lee(Seoul National University), Euijoon Yoon(Seoul National University), Ho Jun Kim(Hanyang University), Sung‐Woo Lee(Chonnam National University Hwasun Hospital), Kangsoo Kim(Samsung (South Korea)), Se Jun Park(Samsung (South Korea)), Daekwang Woo(Samsung (South Korea))
Cited by 5
Related Papers
Data driven computational design of stable oxygen evolution catalysts by DFT and machine learning: Promising electrocatalysts
|Journal of Energy Chemistry|2024|59
Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules
|Applied Surface Science|2020|37
Predictive fabrication of Ni phosphide embedded in carbon nanofibers as active and stable electrocatalysts
|Journal of Materials Chemistry A|2019|29