Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions
B. Colombeau, Christoph Zechner, P. Pichler(Schott (Germany)), Bartek Pawlak(NXP (Belgium)), A. Claverie(Centre National de la Recherche Scientifique), Andrew J. Smith(Intel (United States)), Ray Duffy(NXP (Belgium)), N. E. B. Cowern(University of Surrey), F. Cristiano(Centre National de la Recherche Scientifique), E. Lampin(Centre National de la Recherche Scientifique), C.J. Ortiz(Schott (Germany))
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