Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography
K. B. Nguyen(Sandia National Laboratories California), Linus A. Fetter, Hiroshi Fujioka(Tokyo Institute of Technology), Rodney P. Nissen(Sandia National Laboratories California), Kurt W. Berger(Sandia National Laboratories California), Jeffrey Bokor(Berkeley College), Yon E. Perras(Sandia National Laboratories California), Kevin D. Krenz(Sandia National Laboratories California), Che‐Ming Jack Hu(Institute of Biomedical Sciences, Academia Sinica), Avijit K. Ray-Chaudhuri(Sandia National Laboratories California), Glenn D. Kubiak(Sandia National Laboratories California), D. M. Tennant(University of Tennessee at Knoxville), R. H. Stulen(Sandia National Laboratories California), Steven J. Haney(Sandia National Laboratories California), G. F. Cardinale(Sandia National Laboratories California), Daniel A. Tichenor(Sandia National Laboratories California)
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
November 1, 1996
Cited by 11