Vacancy engineering for highly activated ‘diffusionless’ boron doping in bulk silicon
Nick S. Bennett(University of Surrey), B.J. Sealy(University of Surrey), R. Gwilliam(University of Surrey), N. E. B. Cowern(University of Surrey), H. Kheyrandish, S. Paul(Daimler (Germany)), W. Lerch(Daimler (Germany)), Andrew J. Smith(Intel (United States))
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