Towards optimally shaped fins in P-channel tri-gate FETs: can fin height be reduced further?
Abhisek Dixit(IMEC), K. De Meyer(IMEC), S. Brus(University of Liège), Nadine Collaert(IMEC), Olivier Richard(IMEC), M. Juruzak(IMEC), K.G. Anil(IMEC), M. W. Goodwin(Texas Instruments (United States)), R. Ronyackers(IMEC), A. Mercha(IMEC)
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