Surface Fluorination of Polyimide Thin Films by CF<sub>4</sub> + O<sub>2</sub> Reactive Ion Beam Etching
William E. Vanderlinde(Cornell University), Arthur L. Ruoff(Cornell University)
Cited by 0
Related Papers
Scanning SQUID microscopy for current imaging
|Microelectronics Reliability|2001|49
Reactive ion beam etching of polyimide thin films
|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1988|33
Thermal stability of SrTiO3/SiO2/Si Interfaces at Intermediate Oxygen Pressures
|Journal of Applied Physics|2010|18
Blind Deconvolution of SEM Images
|Proceedings - International Symposium for Testing and Failure Analysis|2007|12
Polymer diffusion as a probe of damage in ion or plasma etching
|Journal of Applied Physics|1990|11