Reactive ion beam etching of polyimide thin filmsWilliam E. Vanderlinde, Arthur L. Ruoff|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1988Cited by 33
Near surface damage induced in polyimides by ion beam etchingWilliam E. Vanderlinde, Arthur L. Ruoff, Edward J. Kramer et al.|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1985Cited by 9
Diffusion of reactive ion beam etched polymersS. F. Tead, Edward J. Kramer, William E. Vanderlinde et al.|Applied Physics Letters|1988Cited by 7
Surface Fluorination of Polyimide Thin Films by CF<sub>4</sub> + O<sub>2</sub> Reactive Ion Beam EtchingWilliam E. Vanderlinde, Arthur L. Ruoff|MRS Proceedings|1986Cited by 0