Formation of ternary Ni-silicide on relaxed and strained SiGe layers
Qing‐Tai Zhao(Forschungszentrum Jülich), S. Mantl(Forschungszentrum Jülich), Roger Loo(IMEC), Dan Buca(Forschungszentrum Jülich), Matty Caymax(IMEC), St. Lenk(Forschungszentrum Jülich)
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