Asymmetric strain relaxation in patterned SiGe layers: A means to enhance carrier mobilities in Si cap layers
Dan Buca(Forschungszentrum Jülich), Matty Caymax(IMEC), B. Holländer, S. Feste(Forschungszentrum Jülich), H. Trinkaus(Forschungszentrum Jülich), Roger Loo(IMEC), St. Lenk(Forschungszentrum Jülich), S. Mantl(Forschungszentrum Jülich)
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