Characterization of AZ PN114 resist for soft-x-ray projection lithography

K. Early(AT&T (United States)), Daniel A. Tichenor(Sandia National Laboratories California), Glenn D. Kubiak(Sandia National Laboratories California), D. M. Tennant(University of Tennessee at Knoxville), Dae‐Young Jeon(AT&T (United States)), P. P. Mulgrew(AT&T (United States)), O. R. Wood(AT&T (United States)), A. A. MacDowell(AT&T (United States))

Applied Optics

December 1, 1993

10.1364/ao.32.007044

Cited by 11

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