Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Wei‐Bor Tsai(National Taiwan University), T. Gustafsson(Uppsala University), Chao Zhao, Thierry Conard(IMEC), Eric Garfunkel(Rutgers, The State University of New Jersey), Wilfried Vandervorst(Imec the Netherlands), Matty Caymax(IMEC), Edward Young(Planetary Science Institute), Marc Heyns(IMEC), Olivier Richard(IMEC), J. Pétry(Service Public Fédéral Économie), V. Cosnier(Imec the Netherlands), M. Tuominen(ASM International (Belgium)), Hiroshi Nohira(Musashi University), S. DeGendt(IMEC), W.H. Schulte(Ruhr University Bochum), R. J. Carter(IMEC), Jan Willem Maes(ASM International (Belgium))
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