Influence of the anneal conditions on arsenic activation during solid-phase epitaxial regrowth

B. J. Pawlak(Philips (Belgium)), Y. Tamminga(Philips (Netherlands)), Wilfried Vandervorst(Imec the Netherlands), Andrew J. Smith(Intel (United States)), Ray Duffy(NXP (Belgium)), Karen Maex(IMEC), T. Dao(Philips (Netherlands)), N. E. B. Cowern(University of Surrey), Tom Janssens(IMEC)
Applied Physics Letters
July 14, 2005
10.1063/1.1997276
Cited by 14

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