Resistive Switching Performance Improvement of ${\rm Ta}_{2}{\rm O}_{5-x}/{\rm TaO}_{y}$ Bilayer ReRAM Devices by Inserting ${\rm AlO}_{\delta}$ Barrier Layer

Huaqiang Wu(Beijing Advanced Sciences and Innovation Center), He Qian(University of Science and Technology of China), Feiyang Huang(Institute of Microelectronics), Xinyi Li(Institute of Microelectronics), Minghao Wu(Institute of Microelectronics), Zhiping Yu(Beijing Microelectronics Technology Institute)
IEEE Electron Device Letters
November 19, 2013
Cited by 62


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