Suppression of boron transient enhanced diffusion in SiGe heterojunction bipolar transistors by carbon incorporation

L. Lanzerotti(Princeton University), C. W. Magee(RCA (United States)), Temel Büyüklimanli, R. Hull(University of Virginia), James C. Sturm(Princeton University), E.A. Stach(Purdue University West Lafayette)
Applied Physics Letters
June 9, 1997
Cited by 54


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