Characterization of near-field holography grating masks for optoelectronics fabricated by electron beam lithography

D. M. Tennant(University of Tennessee at Knoxville), J-M. Verdiell(AT&T (United States)), R. P. Gnall(AT&T (United States)), T. L. Koch(AT&T (United States)), P. P. Mulgrew(AT&T (United States)), F. Ostermeyer(AT&T (United States))

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

November 1, 1992

10.1116/1.586052

Cited by 49

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