Aqueous solution–gel preparation of ultrathin ZrO2 films for gate dielectric application
An Hardy(IMEC), J. Mullens(Hasselt University), Matty Caymax(IMEC), Marc Heyns(IMEC), Alexis Franquet(IMEC), Olivier Douhéret(IMEC), Christoph Adelmann(Imec the Netherlands), Stefan De Gendt(Imec the Netherlands), I. Haeldermans(Hasselt University), Sven Van Elshocht(Columbia University), Jan D’Haen(Imec the Netherlands), Marlies K. Van Bael(IMEC), M. D’Olieslaeger(IMEC), Thierry Conard(IMEC)
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