Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching reactor
Nicolas Bulcourt(École Polytechnique), John M. Dyke(University of Southampton), Foo‐Tim Chau(Hong Kong Polytechnic University), Jorge Luque(Lam Research (United States)), Edmond P. F. Lee(Hong Kong Polytechnic University), Daniel Kam‐Wah Mok(Hong Kong Polytechnic University), Eric A. Hudson(Freie Universität Berlin), Jean‐Paul Booth(Centre National de la Recherche Scientifique)
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