CMOS integration of dual work function phase controlled Ni FUSI with simultaneous silicidation of NMOS (NiSi) and PMOS (Ni-rich silicide) gates on HfSiONA. Lauwers, J. A. Kittl, S. Locorotondo et al.|Unknown|2006Cited by 17
Work function engineering by FUSI and its impact on the performance and reliability of oxynitride and Hf-silicate based MOSFETsA. Veloso, S. Bieseinans, K.G. Anil et al.|Unknown|2005Cited by 15
Dual Work Function Phase Controlled Ni-FUSI CMOS (NiSi NMOS, Ni2Si or Ni31Si12 PMOS): Manufacturability, Reliability & Process Window Improvement by Sacrificial SiGe CapJ. A. Kittl, A. Veloso, S. Biesemans et al.|Unknown|2006Cited by 9