Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature sizeZongsong Gan, Miṅ Gu, Yaoyu Cao et al.|Nature Communications|2013Cited by 556
High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerizationYaoyu Cao, Miṅ Gu, Zongsong Gan et al.|Optics Express|2011Cited by 125
New photoresists for super-resolution photo-inhibition nanofabricationYaoyu Cao, Miṅ Gu, Zongsong Gan et al.|Unknown|2011Cited by 1
Nano-photolithography using doughnut beam induced photoinhibitionYaoyu Cao, Min Gu, Zongsong Gan et al.|Swinburne figshare (Swinburne University of Technology)|2010Cited by 1
Optical beam lithography beyond the diffraction limitMin Gu, Richard A. Evans, Yaoyu Cao et al.|SPIE Newsroom|2013Cited by 0