Immersion defect performance and particle control method for 45nm mass productionTakahito Chibana, Hirohisa Oda, Masamichi Kobayashi et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2008Cited by 5
Analysis of 193nm immersion specific defectsAkihiko Otoguro, Masamichi Kobayashi, Kenji Watanabe et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2006Cited by 5
Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass productionKeiji Yoshimura, Tsuneo Kanda, Yoshio Kawanobe et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2008Cited by 4