Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production

Keiji Yoshimura(Canon (Japan)), Tsuneo Kanda(Canon (Japan)), Hideo Hata(Pennsylvania State University), Yoshio Kawanobe(Canon (Japan)), Takeaki Ebihara(Canon (Japan)), Hitoshi Nakano(Canon (Japan)), Masamichi Kobayashi(Ryukoku University), Nobuyoshi Deguchi(Canon (Japan))
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
March 4, 2008
Cited by 4


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