Analysis of 193nm immersion specific defects
Akihiko Otoguro, Masamichi Kobayashi(Ryukoku University), Kenji Watanabe(University of Shizuoka), Kiyoshi Fujii, Tomohiro Funakoshi(Hitachi High-Tech (Japan)), Tsunehiro Sakai(Hitachi High-Tech (Japan)), Hitoshi Nakano(Canon (Japan)), Jeung-Woo Lee, Toshiro Itani(National Institute of Advanced Industrial Science and Technology), Mikio Arakawa(Canon (Japan))
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
March 10, 2006
Cited by 5
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