Formation of SiGe nanocrystals in HfO2 using <i>in situ</i> chemical vapor deposition for memory applicationsRohit Gupta, Dim-Lee Kwong, Ganesh S. Samudra et al.|Applied Physics Letters|2004Cited by 26
Specific structural factors influencing on reliability of CVD-HfO/sub 2/Yoshihisa Harada, Dim-Lee Kwong, M. Niwa et al.|Unknown|2003Cited by 11