Formation of SiGe nanocrystals in HfO2 using <i>in situ</i> chemical vapor deposition for memory applications
Rohit Gupta(Christian-Albrechts-Universität zu Kiel), Dim-Lee Kwong(The University of Texas at Austin), Kian Ping Loh(Hong Kong Polytechnic University), Yingqian Wang(National University of Defense Technology), Won Jong Yoo(Institute of Nanotechnology), Ganesh S. Samudra(National University of Singapore), Sungjoo Lee(Tohoku University), N. Balasubramanian(Singapore Science Park), Zerlinda Tan(National University of Singapore), D.S.H. Chan(National University of Singapore), L. K. Bera(Singapore Science Park)
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