Ni-based FUSI gates: CMOS Integration for 45nm node and beyondThomas Hoffmann, J. A. Kittl, H. L. Tigelaar et al.|Unknown|2006Cited by 16
Low Power CMOS Featuring Dual Work Function FUSI on HfSiON and 17ps Inverter DelayThomas Hoffmann, S. Biesemans, A. Veloso et al.|Unknown|2006Cited by 4